Melting silica particles into a single form using gas or electric heat, or synthesizing glass using chemicals, both processes create sticky, cross-linked 3D structures with excellent optical properties, thermal shock resistance and low Coefficient of thermal expansion, which means it does not expand significantly with increasing temperature.
Chemical Properties Fused silica produces a chemically inert glass that is believed to have a high level of chemical purity. This means it can be exposed to several different types of chemicals used in commercial, industrial and laboratory settings without degrading or suffering damage. It is compatible with most other chemicals, although both potassium hydroxide and hydrofluoric acid can damage it.
Electrical Properties Fused silica glass is electrically insulating. Its resistance varies with temperature, ranging from 1018 Ω*cm (20 °C) to 1010 Ω*cm (400 °C). It also has good dielectric properties and high frequency performance with low dielectric constant and low dielectric loss. Due to the large silicon-oxygen bond gap in the material structure, only the ionic impurities in the material can be charged and conductive, making it extremely resistant.
Mechanical Properties One of the most unique and advantageous properties of fused silica is its elasticity. Manufacturers can create flexible micromechanical components that would otherwise face breakage or wear during motion. While standard glass cannot be used to produce flexible microdevices because of the risk of cracking during the finishing stage, fused silica is more elastic and resistant to microcracking. Fused silica is also incredibly strong and resistant to compression. Tension is more prone to damage than compression.
Optical Properties Fused silica is a highly transparent material that can be used in applications ranging from ultraviolet to infrared, covering the entire visible spectrum and extending well beyond it. Manufacturers can also customize the delivery of parts by modifying the technology and purity levels used in the production process. Contaminants such as aluminum, iron, and sodium can alter light absorption.
Thermal Properties Fused silica has a low and very consistent coefficient of thermal expansion, making it an excellent material choice for components that need to be stable over a wide temperature range. This feature and its excellent dimensional stability allow it to withstand thermal shock and any associated damage.
Chemical and Medical Precision Glass Fused silica parts can withstand exposure to chemical and pharmaceutical formulations because they are chemically pure and resistant to chemical and thermal damage.
Electronics/Electronics Fused silica can be used to make insulating parts because they are non-conductive, provide high penetration field strength, and ensure low electrical losses.
High Temperature Operation Because of its low coefficient of thermal expansion, fused silica can be used to manufacture parts for high temperature applications.
Light and Laser Technology Fused silica components can be used for laser separation of light.
Optical System Components Manufacturers produce transmissive optical components, mirrors, metrology components and lenses for use in optical systems.
Semiconductors Fused silica is commonly used in semiconductor components due to its purity.
UV Sanitary Fused silica is resistant to high temperatures and radiation, and UV quartz glass can be used to manufacture UV sanitary equipment. It also allows UVC light to pass through and therefore aids in disinfection.
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